Absorbance-modulation optical lithography.

Reverse-absorbance-modulation-optical lithography for optical nanopatterning at low light levels

Barrier-free absorbance modulation for super-resolution optical lithography.

Absorbance-Modulation-Optical Lithography (AMOL) enables super-resolution optical lithography by simultaneous illumination of a photochromic film by a bright spot at one wavelength, λ1 and a node at another wavelength, λ2. A deep subwavelength region of the transparent photochromic isomer is created in the vicinity of the node. Light at λ1 penetrates this region and exposes an underlying photor...

Immersion lithography with numerical apertures above 2.0 using high index optical materials

The progress of optical lithography has approached the sub-30 nm regime using 193nm excimer lasers as the exposure sources. To increase the numerical aperture (NA) further, many issues, especially those related to materials, need to be addressed. In this paper, we present the analytical and experimental results of oblique two-beam lithography with sapphire (Al2O3) as the optical material. At 19...

Fluoropolymers for 157nm Lithography: Optical Properties from VUV Ellipsometry and Absorbance Measurements

With the introduction of 157 nm as the next optical lithography wavelength, the need for new pellicle and photoresist materials optimized for this wavelength has produced much activity in optical characterization of thin film materials. Here we focus on ultratransparent fluoropolymers for 157 nm pellicle applications where absorbances below 0.01/μm are necessary to achieve transmissions above 9...

Fabrication and Optical Characterization of Silicon Nanostructure Arrays by Laser Interference Lithography and Metal-Assisted Chemical Etching

In this paper metal-assisted chemical etching has been applied to pattern porous silicon regions and silicon nanohole arrays in submicron period simply by using positive photoresist as a mask layer. In order to define silicon nanostructures, Metal-assisted chemical etching (MaCE) was carried out with silver catalyst. Provided solution (or materiel) in combination with laser interference lithogr...